magnetron

magnetron

1. Au-MgF2 or Ag-MgF2 is a new type of composite material,PLD and RF magnetron sputtering are very good methods in preparing MgF2 film.

Au-MgF2与Ag-MgF2薄膜是一种新型复合材料,PLD和磁控溅射是很好的镀薄膜方法。

2. Effect of N2 partial pressure on the microstructure and mechanical properties of magnetron sputtered NbN thin films[J].Journal of Shanghai Jiaotong University,2004,38(1):120-124.

N2分压对磁控溅射NbN薄膜微结构与力学性能的影响[J].上海交通大学学报,2004,38(1):120-124.

3. RF reactive magnetron sputtering

RF反应磁控溅射

4. YE Zhi-zhen.The technology of magnetron sputter deposition and it's application in material science[J].Mater Scien Engineering 1989,7(1):26-32.

[6]叶志镇.磁控溅射技术及其在材料科学中的应用[J].材料科学与工程,1989,7(1):26-32.

5. traveling-wave magnetron oscillation

[电] 行波磁控管振荡

6. asymmetrically-split anode magnetron

不对称分辨阳极磁控管

7. In this study , Poly-crystal ZnO films have been grown by RF magnetron sputtering technique and were investigated the CO gas sensing properties .

中文摘要本论文主要以射频磁控溅镀法，探讨氧化锌薄膜对于有毒气体一氧化碳(CO)的感测特性。

8. This thesis is divided into two parts.In the first part, we deposite the flake-like graphite with the mixture of methane, hydrogen and argon in the R.F. magnetron sputtering system.

中文摘要本论文共分成两部份，在第一个部分是在射频溅镀系统中通入甲烷、氢气和氩气的混合气体，成长出片状结构的石墨。

9. medium frequency reactive magnetron sputtering

中频反应磁控溅射

10. medium frequency magnetron sputtering

中频磁控溅射

11. mid-frequency pulsed magnetron sputtering

中频脉冲磁控溅射

12. In order to create microwaves, a magnetron sloshes electric charges up and down an antenna (ideally about one fourth of the wavelength).

为了产生微波，一个磁控管上下振荡电荷（理想情况下大约四分之一波长）。

13. On the other hand, the power can be also used as a set of researching device for insulators treatment and new magnetron sputtering technology (twin sputtering).

也为探索磁控溅射新工艺（交流孪生溅射技术）提供了研究设备。

14. This system can be used either as multi-arc or magnetron sputtering PVD individually.

也可以单独作为磁控溅射或多弧离子镀膜机使用。

15. In 2000, an unbalanced magnetron (UBM) sputtering machine was added to facilitate the research in TiN and ZrN thin films.

于2000年本实验室再添入一套非平衡磁控溅镀机，进行氮化钛与氮化锆薄膜研究。

16. AC Magnetron Sputtering Technology and Application

交流磁控溅射技术及其应用

17. The Structure and characteristics of the magnetron injection gun (MIG) for mm wave gyro-klytron are introduced.

介绍了毫米波回旋速调管磁控注入电子枪的结构与特点。

18. They paid special attention to raising the quality of magnetron and multicavity klystron.

他们特别注意提高磁控管和多腔速调管的质量。

19. By using these targets,CeO2-TiO2 films and CeO2-TiO2/SnO2:Sb films were deposited on soda-lime glass substrates by radio fre-quency magnetron sputtering.

以所制靶材用射频磁控溅射法在普通玻璃基片上沉积了CeO2-TiO2单层和CeO2-TiO2/SnO2:Sb双层薄膜。

20. GaAs films have been deposited on substrates of quartz glass and silicon slices by radio frequency magnetron sputtering technique in the atmosphere with or without hydrogen.

作者单位：五邑大学薄膜与纳米材料研究所;华南理工大学物理科学与技术学院;

21. W-Doped VO2 films were doposited onto glass substrates by double targets magnetron sputtering.

作者通过双靶反应共溅射的方法在玻璃基片上沉积掺钨VO2薄膜。

22. You must help magnetron arrange a series of metal balls in a specific pattern.

你必须帮助磁控管安排了一系列的金属球在一个特定的模式。

23. The ZrN films were deposited by RF magnetron reactive sputtering system.

使用反应性磁控溅镀系统成长氮化锆薄膜。

24. DLC and fluorinated DLC were deposited by enclosed unbalanced magnetron sputtering using C 2H 2 as a reactive gas and C 2F 2 as a fluorine source gas.

使用非平衡磁控溅射方法，以C2H2为反应气，C2F2为氟化气沉积了含氟和不含氟的类金刚石（DLC）薄膜。

25. Magnetron it is characterized by small weight and a low level of the SHF radiation from a cathodic leg.

其特点在于小的重量和低的阴极超高频辐射。

26. cold-cathode gasfilled magnetron

冷阴极充气磁控管

27. distributed emission magnetron amplifier

分布发射磁控管放大器

28. The motion rule of electrons in a DC cylindrical magnetron is investigated.By means of computer,the numerical result is obtained. The trajectories pictures are plotted.

分析了电子在直流磁控管中运动的规律，其轨道方程的积分形式得不出解析解，用计算机进行了数值求解，所得图象十分清晰.

29. Techniques of clinical linac magnetron replacement

医用直线加速器磁控管更换技术探讨

30. reactive radio-frequency magnetron sputtering

反应磁控溅射

31. direct current reactive magnetron sputtering

反应磁控溅射法

32. Advance in reactive magnetron sputtering

反应磁控溅射的进展

33. The Stride magnetron of Auto power adjusting

变频功率发射磁控管规格

34. This paper introduces the structure and working principle of clinical linac magnetron.Speciifc techniques and relevant parameters adjustment in magnetron replacement are mainly discussed.

叙述了医用直线加速器中磁控管的结构及工作原理，并重点介绍在更换磁控管过程中需要注意的技术细节和对相关参数的调整。

35. circular electric mode magnetron

同轴磁控管

36. Miniaturization of the circuitry in a coaxial magnetron is one of the most important ways to miniaturize medical linear accelerators.

同轴磁控管磁路的小型化是使医用直线加速器尺寸小型化的重要途径。

37. WHOOSH : The whooshing sound a microwave oven makes has nothing to do with the magnetron, which resonates at a frequency far too high for human hearing.

嘶嘶声的成因：微波炉发出的嘶嘶声与磁控管无关，磁控管的共鸣频率高于人耳能听到的范围。

38. Since the frequency of the power applied to the magnetron is increased to remove the flicker phenomenon, a stable light can be radiated to an external space.

因为施加于磁控管的电能频率被提高以消除闪烁现象，所以可以向外部空间辐射稳定的光。

39. Stellite coatings were deposited on stainless steel 2Crl3 by DC magnetron sputtering and then were melted by electron beam. Corrosion resistances in 0.5M H2SQ4 and 0.1M NaCl solution were investigated by means of electrochemical technique.

在不锈钢2Cr13表面,用直流磁控溅射沉积,经电子束熔凝处理,获得司太立合金复层,利用电化学技术研究了在0.5M硫酸和0.1M氯化钠溶液中的腐蚀特性.

40. Magnetron is often used as microwave power source in clinical linac magnetron.

在医用直线加速器中通常都采用磁控管作为微波功率源。

41. The optimum method for preparing TiNi thin films is magnetron sputtering (the parameter is: electrical current 0.6 A, vacuum 0.6 Pa, Ar flux 25 SCCM ).

在本实验条件下优选出来的制膜方法为磁控溅射法,工艺参数为溅射电流0. 6 A,真空度0. 6Pa,氩气流量25SCCM。

42. Large Rectangular Magnetron Sputtering Source

大长方形磁控溅射靶

43. Magnetron has filamentary cathode with small time hearting, the shielded cathodic site, liquid cooling and the filter built - in by radio.

它具有加热时间短的细丝阴极，液体冷却和内建无线电滤波。

44. The rectifying properties of La_(0.8)Sr_(0.2)MnO_3(LSMO)/Si with SrMnO_3(SMO) as barrier layer were compared with the one without SMO,prepared by using RF magnetron sputtering on Silicon substrate.

对用磁控溅射方法在硅基上直接沉积La0.8Sr0.2MnO3和引入SrMnO3(SMO)阻挡层后沉积La0.8Sr0.2MnO3进行了比较。

45. The thermal stress in magnetron sputtered Al coating on uranium substrate was studied by thermal elastic plastic finite element method (FEM).

对铀表面磁控溅射沉积铝镀层的热应力进行了热弹塑性有限元分析。

46. radio frequency(RF) reactive magnetron sputtering

射频反应磁控溅射

47. radio frequency(RF) magnetron reactive sputtering

射频磁控反应溅射

48. Radio frequency magnetron co-sputtering

射频磁控复合溅射

49. R.F. magnetron reactive sputtering

射频磁控溅射

50. radio frequency magnetron sputtering

射频磁控管散射

51. This equipment combines both magnetron sputtering and HCD techniques.The multi-functions are realized by plasma-assisted depositions.

将磁控离子镀技术与空心阴极离子镀融合为一体，利用等离子体辅助沉积实现多功能镀膜的目的。

52. However, it was equally significant of improving the modified electrode SERS active system with uniform and Pure Ag nanoparticle coatings based on magnetron sputtering.

尤其重要的是，论文中首次把磁控溅射应用于电极修饰，从而构筑了更高灵敏、高分辨的高效SERS活性体系。

53. Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J].

引用该论文 朱勇,顾培夫,沈伟东,邹桐.

54. Study on the preparation and properties of antireflective ITO thin films by magnetron sputtering[J].

引用该论文 李世涛,乔学亮,陈建国,王洪水,贾芳.

55. Prepulse effects on the characteristics of relativistic magnetron[J].

引用该论文 李天明,李家胤,于秀云,马文多,葛鹏.

56. Electrochromism of WO3 Films Deposited by Mid-Frequency Dual-Target Magnetron Sputtering Method[J].

引用该论文 王丽阁,胡远荣,李国卿,谢为.

57. A numerical calculation of planar DC magnetron discharge with Particle-in-Cell/Monte Carlo Collision method is performed using the magnetic field related to a real magnetron target.

当设计磁控靶表面的磁场一定时，根据计算得到的磁极表面的磁场强度能够得出需要采用磁性材料的强度。

58. ICP -assisted magnetron sputtering

感应耦合等离子磁控溅射

59. Abstract: An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.

摘 要: 本文介绍了一种中频交流脉冲式磁控溅射靶极电源。

60. The research is concentrated in the orientation control and characterization of ruthenium dioxide (RuO2) thin films deposited by RF magnetron sputtering.

摘要:本研究主要是著重在利用反应式射频磁控溅镀法镀制二氧化钌薄膜之指向控制与分析。

61. The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron-beam evaporation and plasma enhanced EB evaporation process were reviewed.

摘要介绍了新一代连续带钢镀膜技术－真空镀膜的工艺特点及应用现状。

62. A special coating system wsa newly developed for metallic film resistors deposited through magnetron sputtering process, which was available to provide low, medium and high-resistance films.

摘要新型磁控溅射电阻镀膜机是在同一台设备上能制作出中、低和高阻值金属膜电阻的专用设备。

63. High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature.

摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。

64. Binder is used to coat on the fabric that is prepared by DC magnetron sputtering to improve the combine fastness of aluminum layer.

摘要直流磁控溅射镀铝织物金属层牢度较差，文章采用在镀铝织物表面涂层粘合剂的方法来改善织物牢度。

65. Magnetron sputtering is a widely used method for thin flint deposition in recent years, which makes a great impact on the industrial production and scientific research.

摘要近年来磁控溅射技术的应用日趋广泛，在工业生产和科学研究领域发挥巨大作用。

66. Recently, various magnetron sputtering lines for depositing thin films on large-size glass substrates developed rapidly and attracted significant attention.

摘要近年来，各种工业生产规模的玻璃基片大平面磁控溅射生产线发展迅速，令人关注。

67. ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details.

摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。

68. oblique angle magnetron sputtering

斜入射磁控溅射

69. Spencer continued to experiment with the magnetron until he boxed it in and marketed it as a new way to cook food.

斯宾塞继续实验磁电管，最后，他用箱子将其包装起来，作为一种烹饪美食的新工具推向市场。

70. Rotating Cylindric Magnetron with No Motor Drive

无马达驱动的旋转圆柱形磁控溅射器

71. Its principle and some other related aspects are briefly described,including the magnetron sputter coater and the osmium plasma coater.

本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等。

72. High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at room temperature.

本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。

73. In this study, the rf magnetron sputtering was used to deposit BZT ferroelectric thin films on Pt/Ti/SiO2/Si and ITO/glass substrates, and MFM and MFIS structures were also fabricated.

根据系统面板化的观念，对于非晶矽薄膜电晶体与多晶矽薄膜电晶体主动阵列显示器之应用，其电晶体的切换特性也被广泛地讨论与研究。

74. Fused salt electrodeposition,magnetron sputtering and chemical vapor deposition were also methods of preparing platinum composite electrode.

此外,铂电极复合方法还有熔盐电镀,磁控溅射,化学气相沉积等,指出了各种方法的优缺点及发展方向。

75. P. Nunes, D. Costa, E. Fortunato and R. Martins, “Performances presented by zinc oxide thin films deposited by r.f. magnetron sputtering,” Vacuum, vol. 64, pp. 293-297, 2002.

水瑞鐏，”氧化锌薄膜特性及其在通讯元件与液体感测器上之应用”，国立成功大学电机工程学系博士论文，(2002)。

76. hot-cathode type magnetron gauge

热磁控超高真空计

77. Nanocrystallized 309 stainless steel coating has been fabricated on glass substrate by DC magnetron sputtering.

用动电位极化、恒电位极化及交流阻抗技术研究了309不锈钢及其溅射纳米涂层在0。

78. TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel.

用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。

79. The results of EPMA showed that the metallicfllms deposited on the metallic substates by the magnetron sputtering ion plating process are the mixed filmswhich consist of the elements of the target and the substrate.

电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。

80. A double-anode magnetron injection gun has been designed and optimized by EGUN for the gyrotron.The electron beam velocity ratio is 1.53, and the velocity spread is 3.1%.

电子枪采用双阳极磁控注入枪，用EGUN对其进行了设计优化，电子注纵横速度比为1.53，速度零散为3.1%。