photoresistance

photoresistance

1. Three different Fourier holograms were recorded on photoresist plates following the above three schemes using the optimized recording conditions obtained in the first part of this study work.

(3)运用空间复用技术，在一定区域内紧靠着记录一系列特定图像的傅里叶全息图。

2. Photoresists, also known as the photoresist is a lot of tasks in process industry on the photosensitive material.

... 光阻，亦称为光阻剂，是一个用在许多任务 业制程上的光敏材料。

3. 248 nm photoresist

248nm光致抗蚀剂

4. AZ photoresist

AZ光胶

5. shipley photoresist

shipley光刻胶

6. SU - 8 photoresist

SU-8光刻胶

7. Study on Deep Reactive Ion Etching of SU-8 Photoresist

SU-8光刻胶氧刻蚀的研究

8. SU-8 photoresist

SU-8胶

9. Study on dimensional precision of UV-lithography on SU-8 photoresist

SU-8胶紫外光刻的尺寸精度研究

10. Study of X-Ray Photoresist

X-射线光刻胶的研究

11. Image Reversal Techniques with a Water-based Chemical Amplified Photoresist

一种可以正负互用的水型化学增幅抗蚀剂的研究

12. A method of increasing the conductivity of a transparent conductive layer, in which a photoresist layer which patterns the transparent layer is given tapered edges and is partially etched.

一种增加透明导电层电导率的方法，其中对透明层成型的光阻材料层具有带锥度的边缘并被部分腐蚀。

13. Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings

一种控制矩形光刻胶光栅槽深和占宽比的方法

14. Studies on a Novel Deep UV Positive Photoresist Material

一种新型深紫外正型光致抗蚀剂材料的研究

15. A New-style Positive Photoresist Lift-off Techniques and Its Application

一种新型的正胶剥离技术及其应用

16. Keywords copolymer of acrylamide and diacetone acrylamide;polyvinylpyrrolidone;water-soluble negative photoresist;

丙烯酰胺-双丙酮丙烯酰胺共聚物;聚乙烯吡咯烷酮;水溶性负性光致抗蚀剂;

17. Photoresist stripping is last step of the lithography process.In order to maintain defect-free conditions for subsequent processes, photoresist must be removed completely.

中文摘要光阻去除是微影制程中的最后一个步骤，其要求是光阻必须完全去除洗净，以确保后续制程的洁净度。

18. The method on profile-control of micro-optic element in photoresist was presented.

介绍了连续微光学元件在光刻胶上的面形控制方法。

19. The positive photoresist AZ4620 was used in lithography process to exposure and develop, an elliptic cylinder onto a Si wafer.

从中找出最佳参数值，作出符合模拟结果的光纤椭圆透镜轮廓。

20. forming a first hard mask pattern by etching the third hard mask layer using the photoresist pattern as an etching mask;

使用该光刻胶图案作为蚀刻掩模对该第三硬掩模层进行蚀刻，形成一第一硬掩模图案；

21. Keywords photoacid generator;photoresist;chemical amplification;sulfonium salt;

光产酸剂;光致抗蚀剂;化学增幅;硫盐;

22. The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms

光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响

23. Photoresist grating masks

光刻胶光栅掩模

24. photoresist lift off

光刻胶剥离

25. photoresist integrity

光刻胶完整性

26. photoresist layer

光刻胶层

27. photoresist pattern delineation

光刻胶层图像形成

28. photoresist masking

光刻胶掩蔽

29. photoresist controlled etch

光刻胶掩蔽控制腐蚀

30. photoresist etching

光刻胶掩蔽腐蚀

31. photoresist developing

光刻胶显影

32. photoresist developer

光刻胶显影剂

33. Melting photoresist

光刻胶热熔

34. photoresist technique

光抗蚀技术

35. photoresistance effect

光敏电阻效应

36. characteristic of photoresistance value

光敏电阻特性

37. photoresistance relay

光敏电阻继电器

38. photoresistance compensator

光敏电阻补偿器

39. STUDIES ON A KIND OF NEGATIVE PHOTORESIST BASED ON PHOTOSENSITIVE POLYIMIDES

光敏聚酰亚胺抗蚀剂的研究

40. Noise in CdS Photoresistance Due to Illumination

光照在CdS光敏电阻中引起的噪声

41. photoresistance cell

光电阻管

42. A Simple Photomask with Photoresist Mask Layer for Ultraviolet-Photolithography and Its Application for Selectively Photochemical Surface Modification of Polymers

光胶做挡光层的紫外光刻掩膜用于高聚物芯片表面选择性光化学改性

43. photoresist coating

光致抗腐蚀涂覆

44. Keywords photoresist;photoacid generator;bromophenol blue;indicator;

光致抗蚀剂;光产酸剂;溴酚兰;指示剂;

45. Keywords photoresiet;photosensitive polyimides;negative photoresist;auto photosensitive;

光致抗蚀剂;光敏聚酰亚胺;负性光刻胶;自增感;

46. photoresist mask

光致抗蚀剂掩模

47. photoresist mask pattern

光致抗蚀剂掩模图形

48. development of photoresist

光致抗蚀剂显影

49. photoresist thin film multi-layer wiring

光致抗蚀剂薄膜多层布线

50. photoresist process

光致抗蚀工艺 光刻法

51. photoresist flow

光致抗蚀通道

52. photoresist flavucidin

光蚀刻的伤痕

53. A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed.

公开了从半导体基底上去除光致抗蚀剂或者光致抗蚀残留物的一种方法。

54. A simulated far-field perturbation generated by a continuous-phase diffractive optical element (DOE) was attempted to achieve with the near-field perturbation obtained on the photoresist.

再利用连续相位式绕射元件模拟出类似近场光微影下的震荡分布，并比较两者的结果。

55. Main factors of influencing photoresist thickness for dip coating is analysed in this paper.

分析了提拉法涂胶中影响胶膜厚度的主要因素，并据此确定出胶膜厚度；

56. A method of fabricating rough surfaces of known statistical parameters by exposing the photoresist to laser speckle patterns is analysed in this paper.

分析了用光刻胶记录激光散斑来制作粗糙度参数可控表面的方法，并成功地制作了一批样品。

57. Rectangular photoresist gratings can be fabricated by taking advantage of the nonlinearity of photoresist.

利用光刻胶的非线性效应可以制作出了矩形的全息光栅。

58. Keywords Chemical amplified;Photosensitive acid generator;Dissolution inhibitor;Negative photoresist;Positive photoresist;

化学增幅;光敏产酸物;阻溶剂;负性光致抗蚀剂;正性光致抗蚀剂;

59. chemically amplified photoresist

化学增幅光致抗蚀剂

60. Keywords chemically amplified photoresist;acid amplifier;photosensitivity;

化学增幅抗蚀剂;酸增殖剂;光致抗蚀剂;感度;

61. Etch Residue Removers and Photoresist Strippers for Semiconductor Cleaning Applications

半导体清洗应用中的刻蚀残渣去除剂和光阻去胶机

62. halide photoresist

卤化物光刻胶

63. Preparation of Antifoaming Agent Used for Developing Semi-Aqueous Dry Film Photoresist

印制线路板显影液用消泡剂的研制

64. thick photoresist

厚层抗蚀剂

65. dry photoresist stripper

去干胶装置

66. removing of photoresist

去胶

67. bi-layer photoresist

双层光刻胶

68. double photoresist

双重光致抗蚀剂

69. inverse photoresist

反型光致抗蚀剂

70. To remove the remaining photoresist I simply soaked the metal in the undiluted stripper solution for a few minutes, brushed it off and washed in clean water.

取消其余的光致抗蚀剂，我只是湿透的金属，在原液汽提塔解决方案，几分钟后，擦肩而过，它起飞和水洗在干净的水。

71. laminated photoresist

叠层光刻胶

72. Comparing with all the existing sacrificial layer materials, the photoresist being used as sacrificial layers has some advantages.

同现有的牺牲层材料相比，光致抗蚀剂作牺牲层材料具有一些优越性。

73. Batch Spray Processing for Superior Photoresist Stripping and Film Removal

喷雾清洗平台优化光阻剥离和薄膜去除工艺

74. solid photoresist

固体光刻胶

75. On the basis of Nickel mould plate fabricated by melting photoresist and elec-troforming PMMA cylindrical microlens arrays are fabricated by the replication technology of static casting plastic.

在光刻热熔成型以及电铸复制得到的柱面微透镜阵列镍模板基础上，采用铸塑工艺得到了高质量的PMMA柱面微透镜阵列。

76. forming a gate oxide layer in the portion in which the photoresist pattern is removed;

在光致抗蚀剂图案被去除的部分形成栅极氧化层；

77. Based on the study of the critical angle effect, a new method named step heat-forming photoresist method to expand the N.A. range of microlens array is presents.

在对临界角效应定性研究的基础上,提出了用阶梯光刻热熔法来扩展热熔型微透镜阵列的数值孔径范围。

78. When using the sputtering nickel system, photoresist and nickel Crosslinking became extremely easy-to-be strong enough to produce water.

在搁置溅射镀镍的编制洋，平刻胶与镍交联后变得格外坚硬，极易爆发水纹。

79. depositing an insulating layer on the etched structure, and etching the deposited insulating layer to expose the thermally treated photoresist pattern;

在蚀刻后的结构上沉积绝缘层，并且蚀刻所沉积的绝缘层以露出热处理后的光致抗蚀剂图案；

80. Research of Microneedle Actuator Based on SU-8 Photoresist

基于SU-8胶的微针执行器的研制